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High throughput applications
ATH 400 M, ATH 1300 M,ATH 1600 M and ATH 2300 M are designed for high pressure, high throughput pumping needed for semiconductor and other thin film coating applications.
5 corrosion proof features
• Automatic balancing system
• Built-in 75°C heating system
• 5 active axes
• Inert gas purge
• Inverted dynamic seal (only for ATH400 and ATH 1300)
A compact and modern design
• Adjustable rotational speed for optimizing pumping parameters
• Very high MTBF
• Low cost of ownership
• Low noise and vibration levels
• Battery free
Applications
• Glass coating,
• Micro systems machining,
• Ion beam rectification,
• Electron microscopy,
• Space simulation chambers,
• Particle accelerators,
• Semiconductor processes (etch, CVD, ion implant),
• Coating and thin films deposition,
• Ion milling
• And many R&D experiments.
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